原子力光刻法制备纳米物体

1999 9th International Crimean Microwave Conference 'Microwave and Telecommunication Technology'. Conference Proceedings (IEEE Cat. No.99EX363) Pub Date : 1999-05-01 DOI:10.1109/CRMICO.1999.815128

N. Vostokov, D. G. Volgunov, V. F. Dryakhlushin, A. Klimov, V. Rogov, L. V. Sukhodoev, V. Shashkin

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引用次数: 0

摘要

开发了一种原子力光刻方法，可以产生<100纳米尺寸的单个元素。它包括用原子力显微镜探针对掩膜层进行变形，然后通过等离子体化学蚀刻和金属触点沉积。

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Fabrication of nanodimensional objects by atomic-force lithography methods

An atomic-force lithography method yielding individual elements of <100 nm size has been developed. It involves deformation of the masking layer with an atomic-force microscope probe, followed by plasma-chemical etching and deposition of metal contacts through the mask.

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来源期刊

1999 9th International Crimean Microwave Conference 'Microwave and Telecommunication Technology'. Conference Proceedings (IEEE Cat. No.99EX363)

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