深紫外母版使用全固态266nm激光器,功率超过14gb /in/sup / 2/

M. Furuki, M. Takeda, H. Yamatsu
{"title":"深紫外母版使用全固态266nm激光器,功率超过14gb /in/sup / 2/","authors":"M. Furuki, M. Takeda, H. Yamatsu","doi":"10.1109/ICCE.1999.785260","DOIUrl":null,"url":null,"abstract":"The deep UV mastering process of the next generation high-density disk is demonstrated using an all-solid-state CW 266 nm laser for the first time. We achieved a density of over 14 Gbit/in/sup 2/ with acceptable jitter using both novolak type resist and chemically amplified resist.","PeriodicalId":425143,"journal":{"name":"1999 Digest of Technical Papers. International Conference on Consumer Electronics (Cat. No.99CH36277)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Deep UV mastering using an all-solid-state 266 nm laser for an over 14 Gb/in/sup 2/\",\"authors\":\"M. Furuki, M. Takeda, H. Yamatsu\",\"doi\":\"10.1109/ICCE.1999.785260\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The deep UV mastering process of the next generation high-density disk is demonstrated using an all-solid-state CW 266 nm laser for the first time. We achieved a density of over 14 Gbit/in/sup 2/ with acceptable jitter using both novolak type resist and chemically amplified resist.\",\"PeriodicalId\":425143,\"journal\":{\"name\":\"1999 Digest of Technical Papers. International Conference on Consumer Electronics (Cat. No.99CH36277)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-06-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1999 Digest of Technical Papers. International Conference on Consumer Electronics (Cat. No.99CH36277)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICCE.1999.785260\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 Digest of Technical Papers. International Conference on Consumer Electronics (Cat. No.99CH36277)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCE.1999.785260","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

首次利用全固态连续波266nm激光器演示了下一代高密度光盘的深紫外母化工艺。我们使用novolak型抗蚀剂和化学放大抗蚀剂实现了超过14 Gbit/in/sup 2/的密度和可接受的抖动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deep UV mastering using an all-solid-state 266 nm laser for an over 14 Gb/in/sup 2/
The deep UV mastering process of the next generation high-density disk is demonstrated using an all-solid-state CW 266 nm laser for the first time. We achieved a density of over 14 Gbit/in/sup 2/ with acceptable jitter using both novolak type resist and chemically amplified resist.
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