Jia Xu, Wei Zhang, Lanjiao Liu, Zuobin Wang, Jin Zhang, Zhengxun Song, Z. Weng, Z. Hu, Y. Yue, Dayou Li
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Phase-shift control in two-beam laser interference lithography
This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined by fringe pattern correlation with subpixel accuracy. This method is useful in two-beam laser interference lithography for the control of phase shifts and fringe positions in interference patterns for multi-exposure patterning applications.
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