使用超薄银或非晶硅薄膜的大面积无光刻完美吸收器,彩色滤光片和可见光频率的光电探测器(演示记录)

Zhongyang Li, S. Butun, Koray Aydin
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引用次数: 0

摘要

等离子体材料和超材料已被广泛用于实现基于局域或非局域共振的光谱传输、反射和吸收滤波器,这些共振是由光子与纳米尺度图案的相互作用产生的。然而,由于纳米制造相关的问题(成本、制造缺陷、表面粗糙度)和金属的光学损耗,基于纳米等离子体材料的可见光、高性能、大面积滤光片的实现相当具有挑战性。在这里,我们提出并展示了大面积完美的吸收器、透射滤色器和光电探测器,它们可以克服使用无光刻方法进行纳米制造的困难。我们的谐振平面光学设计基于改进的非对称金属-绝缘体/半导体-金属(MI/SM)基法布里-珀罗腔,并结合等离子体,损耗超薄(~ 30 nm)银或(~ 5-15 nm)非晶硅薄膜。我们展示了一种窄带宽(~17 nm)的超级吸收体,最大吸收率为97%,其性能与纳米结构/纳米颗粒基超级吸收体相当。我们还研究了通过控制二氧化硅或非晶硅的间隔厚度来获得不同颜色的透射滤光片。该彩色滤光片的透射峰强度可达60%,窄带为~ 40 nm,其性能超过了目前广泛研究的基于等离子体纳米孔阵列的彩色滤光片,是大面积窄带光探测器件的理想选择。使用超薄金属或半导体薄膜的等离子体损耗结合法布里-珀罗腔,可以在光谱选择性光学(彩色和吸收器)滤光片、窄带光电探测器等带宽可控的光电器件和发光器件中提出主动和实际应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Large-area lithography-free perfect absorbers, color filters, and photodetectors at visible frequencies using ultra-thin silver or amorphous silicon films (Presentation Recording)
Plasmonic materials and metamaterials have been widely utilized to achieve spectral transmission, reflection and absorption filters based on localized or delocalized resonances arising from the interaction of photons with nanoscale patterns. However, the realization of visible-frequency, high-performance, large-area, optical filters based on nanoplasmonic materials is rather challenging due to nanofabrication related problems (cost, fabrication imperfection, surface roughness) and optical losses of metals. Here, we propose and demonstrate large-area perfect absorbers and transmission color filters and photodectors that could overcome the difficulties associated with nanofabrication using a lithography-free approach. Our resonant flat optical design is based on a modified, asymmetric metal-insulator/semiconductor-metal (MI/SM) based Fabry-Perot cavity incorporated with plasmonic, lossy ultra-thin (~ 30 nm) Ag or (~ 5-15 nm) amorphous Si films. We demonstrated a narrow bandwidth (~17 nm) super absorber with 97% maximum absorption with a performance comparable to nanostructure/nanoparticle-based super absorbers. We also investigated transmission filters in which different colors can be obtained by controlling the spacer thickness of silicon dioxide or amorphous silicon. With measured performance of transmission peak intensity reaching 60% and a narrow-band of ~ 40 nm, our color filters exceed the performance of widely studied plasmonic nanohole array based color filters and make a good candidate for large-area narrow-band photodetection devices. Such plasmonic loss incorporated Fabry-Perot cavities using ultra-thin metallic or semiconductor films could suggest active and practical applications in spectrally selective optical (color and absorber) filters, optoelectronic devices with controlled bandwidth such as narrow-band photodetectors, and light-emitting devices.
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