加工方法对氧化石墨烯/PVDF纳米复合材料介电性能的影响

Fei Liu, R. Huo, Xingyi Huang, P. Jiang
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引用次数: 4

摘要

采用溶液混合、热压成型和溶液浇铸法制备了不同氧化石墨烯含量的氧化石墨烯纳米片/PVDF纳米复合材料。在102 ~ 107 Hz的宽频率范围内测定了这些纳米复合材料的介电行为。采用热压成型法制备的GOn/PVDF纳米复合材料中存在渗滤现象。结果表明,在180°C, 8 min的成型条件下,纳米复合材料中的氮化镓在原位发生了部分还原。由于石墨烯表面羰基与PVDF中的氟基之间具有强而特异的相互作用,使得石墨烯在基体内均匀分散和分布,达到了接近0.5 wt%的渗透阈值,低于石墨烯片/PVDF纳米复合材料。发现原位还原的GOn/PVDF纳米复合材料的介电常数随GOn含量的增加而增加,而溶液铸造的样品的介电常数低于1 wt%的纯PVDF。在原位还原的GOn/PVDF纳米复合材料中,观察到随着GOn含量的增加,PVDF从α-相结构逐渐转变为β-相结构,这也证实了制备过程中的热应力破坏了GOn表面的含氧基团。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of processing method on the dielectric behavior of graphene oxide/PVDF nanocomposites
Graphene oxide nanosheets (GOn)/PVDF nanocomposites with various GOn contents were fabricated using solution mixing followed by hot press molding and solution casting respectively. The dielectric behavior of those nanocomposites was determined over a wide frequency range from 102 to 107 Hz. The percolation phenomenon was observed in GOn/PVDF nanocomposites prepared by hot press molding method instead of solution casting method. It indicates that the GOn in nanocomposites were partially reduced in-situ under the molding conditions (180 °C, 8 min). And a percolation threshold of nearly 0.5 wt% was achieved by the homogeneous dispersion and distribution of GOn within the matrix due to the strong and specific interaction between carbonyl group in GOn surface and fluorine group in PVDF, which is lower than that of graphene sheets (GSs)/PVDF nanocomposites reported. The dielectric permittivity of in-situ reduced GOn/PVDF nanocomposites was found to increase with increasing GOn contents, while the dielectric permittivity of samples by solution casting with GOn contents lower than 1 wt% was found to be lower than that of pure PVDF. The gradual crystal transformation of PVDF from α-phase structure into β-phase with increasing GOn contents was observed in the in-situ reduced GOn/PVDF nanocomposites, which also confirms the destruction of oxygen-containning groups in GOn surface due to the thermal stress in sample preparation.
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