低VMIN 20nm嵌入式SRAM与多电压文字线控制为基础的读写辅助技术

M. Bhargava, Y. Chong, Vincent Schuppe, B. Maiti, M. Kinkade, Hsin-Yu Chen, A. Chen, S. Mangal, Jacek Wiatrowski, G. Gouya, A. Baradia, S. Thyagarajan, Gus Yeung
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引用次数: 16

摘要

本文介绍了采用读写辅助技术的20nm SRAM阵列的VMIN测量结果。提出了一种新的辅助技术,该技术仅通过控制字线电压而不使用单独的电源电压来提供读写辅助。与现有的WL驱动下读取辅助设计相比,WL驱动器使用WL浮子技术来减少直流路径电流。辅助技术使高密度6T (6T- hd) SRAM的VMIN提高143mV,高速6T (6T- hs) SRAM的VMIN提高96mV, 8T双端口(DP) SRAM的VMIN提高86mV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low VMIN 20nm embedded SRAM with multi-voltage wordline control based read and write assist techniques
Measured results of VMIN from 20nm SRAM arrays with read and write assist techniques are presented for multiple flavors of bitcell. A novel assist technique is presented, that provides both read and write assist by controlling only the voltage of wordline (WL) and without using a separate supply voltage. The WL-drivers use a WL float technique to reduce the dc-path current compared to existing WL under-drive read assist designs. The assist technique resulted in a VMIN improvement of 143mV for the high-density 6T (6T-HD) SRAM, 96mV for the high-speed 6T (6T-HS) SRAM, and 86mV for the 8T dual-port (DP) SRAM.
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