直接激光写入法制备三元硫系薄膜表面浮雕光学元件

I. Voynarovych, R. Poehlmann, S. Schroeter, M. Vlcek
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引用次数: 0

摘要

采用连续波高强度超带隙激光器直接激光写入,实现了三元As-S-Se和Ge-As-S硫系薄膜的表面浮雕光学元件。研究了所创建结构的拓扑结构与实验条件的关系。分析表明,表面图案的形成机制是由局部加热引起的热诱导过程,涉及热塑性变形、表面张力梯度引起的质量流动和蒸发。在1µm厚的薄膜表面绘制了周期为2.56µm、深度为100 nm和不同周期表面结构的衍射光栅。对衍射效率的光谱依赖性进行了测量和讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of surface relief optical elements in ternary chalcogenide thin films by direct laser writing
Direct laser writing with a continuous-wave high intensity and over-band gap laser is applied to realize surface relief optical elements in ternary As-S-Se and Ge-As-S thin chalcogenide films. The topology of created structures in dependence on the experimental conditions is investigated. Analyses indicate that the formation mechanisms of the surface patterns are thermally induced processes generated by the local heating and involve thermoplastic deformation, mass flow induced by the surface tension gradient and evaporation. Diffractive gratings with a period of 2.56 µm, depths of up to 100 nm, and different periodic surface structures were patterned at the surface of 1 µm thick films. The spectral dependencies of diffraction efficiency were measured and discussed.
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