片上系统封装冷却系统的研究

Rong-rong Cao, Guandong Liu, J. Li, Weihao Wang, Chuanzhi Wang, Ling-Li Liu, Yuanxing Duan
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引用次数: 0

摘要

系统单片封装技术具有高密度集成度和强大的功能等优点,是一种很有前途的封装方法,可以满足后摩尔时代对系统性能提升的要求。然而,高密度集成也导致了严重的散热问题。提出了一种基于流态冷却板的SoW封装冷却系统。采用有限元法研究了硅片上假晶片的温度分布和不同流道形状的冷却板的散热能力。冷却实验结果表明,该冷却系统能有效降低芯片温度。与自然空气冷却时在晶圆上加热虚拟芯片的平均温度102℃相比,采用晶圆级冷却系统获得的平均温度为49.2℃。当流体通道中冷却水的流量为1.5 L/min时,串联式冷却系统的散热能力可达0.14 W/mm$^{2}$, 4英寸硅片上加热虚拟芯片的温度均匀性为98.2%,表明该散热方式在片级系统散热中具有潜在的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Research on the Cooling System for the System-on-Wafer Packaging
With the advantages of high-density integration and strong function, the system-on-wafer (SoW) packaging technology is a promising method, which can meet the requirements of improving system performances in the post-Moore era. However, the high-density integration also leads to a serious heat dissipation problem. This paper presents a cooling system based on fluidic cooling plates for the SoW packaging. The temperature distributions of the dummy chiplets on a wafer and the heat dissipation capacity of the cooling plates with different shapes of the fluidic channels were researched using the finite element method (FEM). The results of the cooling experiments showed that the cooling system can effectively reduce the temperatures of the chips. Compared with an average temperature of 102°C of the heating dummy chips on the wafer with natural air cooling, an average temperature of 49.2°C was obtained using the wafer-level cooling system. When the water flow rate of the cooling water in the fluidic channel was set to 1.5 L/min, the heat dissipation capacity of the series-type cooling system can reach 0.14 W/mm$^{2}$ and the temperature uniformity of the heating dummy chips on a 4-inch silicon wafer was 98.2%, which indicate the wafer-level cooling method has potential applications in the heat dissipation for the wafer-level systems.
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