用单纳米金或银粒子催化湿法制备的硅太阳能电池的抗反射结构

K. Nishioka, T. Sueto, N. Saito
{"title":"用单纳米金或银粒子催化湿法制备的硅太阳能电池的抗反射结构","authors":"K. Nishioka, T. Sueto, N. Saito","doi":"10.1109/PVSC.2009.5411705","DOIUrl":null,"url":null,"abstract":"Antireflection nano structure was formed by simple wet chemical etching using catalysis of gold (Au) or silver (Ag) nanoparticle. Single nano-sized particle dispersion solution was coated onto Si(100) substrate with polished surface. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of etched Si substrate appeared black, and the reflectivity was reduced to below 5% throughout the entire spectrum from 200 to 1000 nm owing to the formed nano structure. The absorption was significantly increased after the formation of antireflection structure, and the conversion efficiency of solar cell with antireflection structure increased from 8.52 to 10.0% owing to the increase of short-circuit current.","PeriodicalId":411472,"journal":{"name":"2009 34th IEEE Photovoltaic Specialists Conference (PVSC)","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-06-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Antireflection structure of silicon solar cells formed by wet process using catalysis of single nano-sized gold or silver particle\",\"authors\":\"K. Nishioka, T. Sueto, N. Saito\",\"doi\":\"10.1109/PVSC.2009.5411705\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Antireflection nano structure was formed by simple wet chemical etching using catalysis of gold (Au) or silver (Ag) nanoparticle. Single nano-sized particle dispersion solution was coated onto Si(100) substrate with polished surface. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of etched Si substrate appeared black, and the reflectivity was reduced to below 5% throughout the entire spectrum from 200 to 1000 nm owing to the formed nano structure. The absorption was significantly increased after the formation of antireflection structure, and the conversion efficiency of solar cell with antireflection structure increased from 8.52 to 10.0% owing to the increase of short-circuit current.\",\"PeriodicalId\":411472,\"journal\":{\"name\":\"2009 34th IEEE Photovoltaic Specialists Conference (PVSC)\",\"volume\":\"37 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-06-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 34th IEEE Photovoltaic Specialists Conference (PVSC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PVSC.2009.5411705\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 34th IEEE Photovoltaic Specialists Conference (PVSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2009.5411705","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

在金(Au)或银(Ag)纳米粒子的催化作用下,通过简单的湿法化学刻蚀形成抗反射纳米结构。将单纳米颗粒分散液涂覆在表面抛光的Si(100)衬底上。然后,将样品浸泡在氢氟酸和过氧化氢的蚀刻水溶液中。由于形成纳米结构,蚀刻后的Si衬底表面呈现黑色,在200 ~ 1000 nm全光谱范围内反射率降至5%以下。增透结构形成后,吸收显著增加,由于短路电流增加,增透结构太阳能电池的转换效率由8.52%提高到10.0%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Antireflection structure of silicon solar cells formed by wet process using catalysis of single nano-sized gold or silver particle
Antireflection nano structure was formed by simple wet chemical etching using catalysis of gold (Au) or silver (Ag) nanoparticle. Single nano-sized particle dispersion solution was coated onto Si(100) substrate with polished surface. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of etched Si substrate appeared black, and the reflectivity was reduced to below 5% throughout the entire spectrum from 200 to 1000 nm owing to the formed nano structure. The absorption was significantly increased after the formation of antireflection structure, and the conversion efficiency of solar cell with antireflection structure increased from 8.52 to 10.0% owing to the increase of short-circuit current.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信