热电多层膜的合成与评价

A. V. Wagner, R. Foreman, L. Summers, T. Barbee, J. Farmer
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引用次数: 4

摘要

用磁控溅射法制备了(Bi/sub - 1-x/Sb/sub -x/)/sub - 2/(Te/sub - 1-y/Se/sub -y/)/sub - 3/热电多层膜。周期为140 /spl的结构在生长ZT>0.5的单层晶膜所需的高沉积温度下具有稳定的互扩散。这些多层层具有正确的尺寸,以显示量子阱结构的电子特性。此外,该多层结构的存在并没有降低薄膜的塞贝克系数。通过优化势垒的组成,使势垒高度最大化,有可能合成具有增强ZT的多层热电材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Synthesis and evaluation of thermoelectric multilayer films
The deposition of compositionally-modulated (Bi/sub 1-x/Sb/sub x/)/sub 2/(Te/sub 1-y/Se/sub y/)/sub 3/ thermoelectric multilayer films by magnetron sputtering has been demonstrated. Structures with a period of 140 /spl Aring/ are shown to be stable to interdiffusion at the high deposition temperatures necessary for growth of single-layer crystalline films with ZT>0.5. These multilayers are of the correct dimension to exhibit the electronic properties of quantum well structures. Furthermore it is shown that the Seebeck coefficient of the films is not degraded by the presence of this multilayer structure. It may be possible to synthesize a multilayer thermoelectric material with enhanced ZT by maximizing the barrier height through optimization of the composition of the barrier.
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