图案化衬底上氮化硼薄膜的电子发射

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) Pub Date : 2004-07-11 DOI:10.1109/IVNC.2004.1355009

H. Shima, S. Funakawa, C. Kimura, T. Sugino

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引用次数: 0

摘要

本文研究了在图案化衬底上沉积的氮化硼纳米膜的场发射特性，从而提高了场增强系数。结果表明，阈值电场的减小和发射位点的增加。电子发射的均匀性得到了显著改善。

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Electron emission from boron nitride films deposited on patterned substrates

In this paper field emission characteristics are investigated for the BN nanofilm deposited on the patterned substrate which leads to an increase of the field enhancement factor. A reduction in the threshold electric field and an increase of the emission site are demonstrated. Uniformity of the electron emission is significantly improved.

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Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)

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