三维集成电路的设计和CAD

P. Franzon, W. R. Davis, M. Steer, S. Lipa, Eun Chu Oh, T. Thorolfsson, S. Melamed, S. Luniya, Tad Doxsee, Stephen Berkeley, Ben Shani, Kurt Obermiller
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引用次数: 24

摘要

高密度硅通孔(TSV)可用于构建3dic,使其在计算,信号处理和内存密集型系统中具有独特的应用。本文介绍了几个案例研究,这些案例研究通过3D实现得到了独特的增强,包括3D CAM、FFT处理器和SAR处理器。描述了用于实现这些设计的CAD流程。3DIC需要比2DIC设计更高的保真度热建模。建立了这一需求的基本原理,并提出了一个可能的解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and CAD for 3D integrated circuits
High density through silicon vias (TSV) can be used to build 3DICs that enable unique applications in computing, signal processing and memory intensive systems. This paper presents several case studies that are uniquely enhanced through 3D implementation, including a 3D CAM, an FFT processor, and a SAR processor. The CAD flow used to implement for these designs is described. 3DIC requires higher fidelity thermal modeling than 2DIC design. The rationale for this requirement is established and a possible solution is presented.
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