{"title":"差分浮栅电容失配测量技术","authors":"J. Hunter, P. Gudem, S. Winters","doi":"10.1109/ICMTS.2000.844421","DOIUrl":null,"url":null,"abstract":"This paper describes a differential floating gate capacitance matching measurement technique that offers a significant improvement in resolution over those previously reported. It's smaller differential output voltage can be measured to a much higher precision than that of a standard structure. In addition, the differential technique offers superior cancellation of parasitic overlap capacitance effects. Our technique was successfully demonstrated on a 0.50 /spl mu/m analog BiCMOS technology.","PeriodicalId":447680,"journal":{"name":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":"{\"title\":\"A differential floating gate capacitance mismatch measurement technique\",\"authors\":\"J. Hunter, P. Gudem, S. Winters\",\"doi\":\"10.1109/ICMTS.2000.844421\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes a differential floating gate capacitance matching measurement technique that offers a significant improvement in resolution over those previously reported. It's smaller differential output voltage can be measured to a much higher precision than that of a standard structure. In addition, the differential technique offers superior cancellation of parasitic overlap capacitance effects. Our technique was successfully demonstrated on a 0.50 /spl mu/m analog BiCMOS technology.\",\"PeriodicalId\":447680,\"journal\":{\"name\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"volume\":\"46 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2000.844421\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2000.844421","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A differential floating gate capacitance mismatch measurement technique
This paper describes a differential floating gate capacitance matching measurement technique that offers a significant improvement in resolution over those previously reported. It's smaller differential output voltage can be measured to a much higher precision than that of a standard structure. In addition, the differential technique offers superior cancellation of parasitic overlap capacitance effects. Our technique was successfully demonstrated on a 0.50 /spl mu/m analog BiCMOS technology.