AlInAs在光子晶体激光器中的氧化阻挡电流

R. Zhang, J. V. D. van der Tol, H. Ambrosius, P. Thijs, B. Smalbrugge, T. de Vries, G. Roelkens, F. Bordas, M. Smit
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引用次数: 5

摘要

研制电泵浦光子晶体薄膜激光器是一项具有挑战性的任务。其中一个问题是,当薄膜厚度限制在200-300nm时,如何避免激光二极管的p掺杂部分和n掺杂部分之间的短路。我们提出利用AlInAs的氧化物来实现电流阻断功能。这样,基于亚微米选择性区域再生,我们的目标是实现高输出功率、小阈值电流和低功耗的电注入光子晶体激光器。本文介绍了AlInAs氧化的结果。结果表明,在基于inp的膜光子晶体激光器中,利用AlInAs的氧化物进行电流阻断是可行的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Oxidation of AlInAs for current blocking in a photonic crystal laser
To make an electrically pumped photonic crystal membrane laser is a challenging task. One of the problems is how to avoid short circuiting between the p- and n-doped parts of the laser diode, when the membrane thickness is limited to 200–300nm. We propose to use the oxide of AlInAs to realize a current blocking function. In this way, based on submicron selective area re-growth, we aim for electrically injected photonic crystal lasers with high output power, small threshold currents and low power consumption. Here results are presented on the oxidation of AlInAs. The results show that it is feasible to use the oxide of AlInAs for current blocking in an InP-based membrane photonic crystal laser.
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