在levenshstein测度下寻找高阶基元

E. Adebiyi, Tinuke Dipe
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引用次数: 0

摘要

我们研究了在levenshtein测度(也称为编辑距离)下寻找高阶基元的问题。在问题设置中,我们给出N个序列,每个序列的平均长度为N,在有限的字母表/spl Sigma/和阈值D和q上,我们要在1 /spl les/ q /spl les/ N个不同的序列中找到包含长度为P的基元(这些基元几乎有D个差异)的复合基元。Marsan和Sagot提出了在编辑距离下寻找高阶基序的两种有趣但复杂的算法。他们的第二种算法要复杂得多,而且复杂度也不是更好。他们的第一个算法在O(M /spl middot/ N/sup 2/ N/sup 1+/spl alpha/ /spl middot/p /spl middot/ pow(/spl epsi/)/)中运行,其中p /spl ges/ 2, /spl alpha/ > 0, pow(/spl epsi/)是小于1的凹函数,/spl epsi/= D/ p, M是所有单元的期望数目。我们提出了一种基于所描述的概念的编辑距离的替代算法方法。结果算法更简单,运行时间为O(N/sup 2/ N/sup 1+p /spl middot/ pow(/spl epsi/)/)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Finding higher order motifs under the levenshtein measure
We study the problem of finding higher order motifs under the levenshtein measure, otherwise known as the edit distance. In the problem set-up, we are given N sequences, each of average length n, over a finite alphabet /spl Sigma/ and thresholds D and q, we are to find composite motifs that contain motifs of length P (these motifs occur with almost D differences) in 1 /spl les/ q /spl les/ N distinct sequences. Two interesting but involved algorithms for finding higher order motifs under the edit distance was presented by Marsan and Sagot. Their second algorithm is much more complicated and its complexity is asymptotically not better. Their first algorithm runs in O(M /spl middot/ N/sup 2/n/sup 1+/spl alpha/ /spl middot/p /spl middot/ pow(/spl epsi/)/) where p /spl ges/ 2, /spl alpha/ > 0, pow(/spl epsi/) is a concave function that is less than 1, /spl epsi/= D/P and M is the expected number of all monad motifs. We present an alternative algorithmic approach also for Edit distance based on the concept described. The resulting algorithm is simpler and runs in O(N/sup 2/n/sup 1+p /spl middot/ pow(/spl epsi/)/) expected time.
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