超低电压/低功耗0.25um (n+/p+)双工功能CMOS技术的实现与评价

U. Schwalke, J. Berthold, A. Bourenkov, M. Eisele, R. Krieg, A. Narr, D. Schumann, R. Seibert, R. Thanner
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引用次数: 0

摘要

在CMOS电路中,降低电源电压是降低功耗的最有效方法。因此,许多低功耗应用的最终目标是单电池工作,标称电源电压为1.2V,寿命终止电压为0.9V。另一方面,当电源电压(Vdd)降低时,往往会牺牲电路性能。为了补偿驱动电流的损失,降低了阈值电压(Vth)。然而,这种方法需要Nand PMOS器件具有优化栅极工作功能的n+/p+栅极技术,以在低电压下获得足够的性能,并且仍然保持良好的短通道行为以及低关漏(Ioff)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Realization and Evaluation of an Ultra Low-Voltage/Low-Power 0.25um (n+/p+) Dual-Workfunction CMOS Technology
1 2 & The decrease in supply voltage is the most effective approach to reduce power consumption in CMOS circuits. Accordingly, the ultimate goal for many low-power applications is aimed at a single-battery operation with a nominal supply voltage of 1.2V and an end-of-life voltage of 0.9V. On the other hand, circuit performance is often sacrified when supply voltage (Vdd) is reduced. In order to compensate for the loss in drive current, threshold voltage (Vth) is reduced. This approach, however, requires an n+/p+ gate technology /1/ with optimized gate workfunction for Nand PMOS devices to achieve sufficient performance at low voltage and still maintain good short channel behavior as well as low off-leakage (Ioff).
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