U. Schwalke, J. Berthold, A. Bourenkov, M. Eisele, R. Krieg, A. Narr, D. Schumann, R. Seibert, R. Thanner
{"title":"超低电压/低功耗0.25um (n+/p+)双工功能CMOS技术的实现与评价","authors":"U. Schwalke, J. Berthold, A. Bourenkov, M. Eisele, R. Krieg, A. Narr, D. Schumann, R. Seibert, R. Thanner","doi":"10.1109/ESSDERC.1997.194405","DOIUrl":null,"url":null,"abstract":"1 2 & The decrease in supply voltage is the most effective approach to reduce power consumption in CMOS circuits. Accordingly, the ultimate goal for many low-power applications is aimed at a single-battery operation with a nominal supply voltage of 1.2V and an end-of-life voltage of 0.9V. On the other hand, circuit performance is often sacrified when supply voltage (Vdd) is reduced. In order to compensate for the loss in drive current, threshold voltage (Vth) is reduced. This approach, however, requires an n+/p+ gate technology /1/ with optimized gate workfunction for Nand PMOS devices to achieve sufficient performance at low voltage and still maintain good short channel behavior as well as low off-leakage (Ioff).","PeriodicalId":424167,"journal":{"name":"27th European Solid-State Device Research Conference","volume":"73 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-09-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Realization and Evaluation of an Ultra Low-Voltage/Low-Power 0.25um (n+/p+) Dual-Workfunction CMOS Technology\",\"authors\":\"U. Schwalke, J. Berthold, A. Bourenkov, M. Eisele, R. Krieg, A. Narr, D. Schumann, R. Seibert, R. Thanner\",\"doi\":\"10.1109/ESSDERC.1997.194405\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"1 2 & The decrease in supply voltage is the most effective approach to reduce power consumption in CMOS circuits. Accordingly, the ultimate goal for many low-power applications is aimed at a single-battery operation with a nominal supply voltage of 1.2V and an end-of-life voltage of 0.9V. On the other hand, circuit performance is often sacrified when supply voltage (Vdd) is reduced. In order to compensate for the loss in drive current, threshold voltage (Vth) is reduced. This approach, however, requires an n+/p+ gate technology /1/ with optimized gate workfunction for Nand PMOS devices to achieve sufficient performance at low voltage and still maintain good short channel behavior as well as low off-leakage (Ioff).\",\"PeriodicalId\":424167,\"journal\":{\"name\":\"27th European Solid-State Device Research Conference\",\"volume\":\"73 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-09-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"27th European Solid-State Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSDERC.1997.194405\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"27th European Solid-State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.1997.194405","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Realization and Evaluation of an Ultra Low-Voltage/Low-Power 0.25um (n+/p+) Dual-Workfunction CMOS Technology
1 2 & The decrease in supply voltage is the most effective approach to reduce power consumption in CMOS circuits. Accordingly, the ultimate goal for many low-power applications is aimed at a single-battery operation with a nominal supply voltage of 1.2V and an end-of-life voltage of 0.9V. On the other hand, circuit performance is often sacrified when supply voltage (Vdd) is reduced. In order to compensate for the loss in drive current, threshold voltage (Vth) is reduced. This approach, however, requires an n+/p+ gate technology /1/ with optimized gate workfunction for Nand PMOS devices to achieve sufficient performance at low voltage and still maintain good short channel behavior as well as low off-leakage (Ioff).