基于Al2O3和ZnO超晶格结构的发光薄膜的原子层沉积研究

2021 26th Microoptics Conference (MOC) Pub Date : 2021-09-26 DOI:10.23919/MOC52031.2021.9598068

Shun Kobayashi, A. Nakamura, W. Inami, Y. Kawata

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引用次数: 0

摘要

采用ALD法制备了ZnO和Al2O3薄膜。对晶体结晶度、表面粗糙度、发射强度和发光强度的空间均匀性进行了评价。结果表明，随着Al2O3层数的增加，晶体结晶度、表面粗糙度和发射强度的空间均匀性都有所提高，但发光强度却有所降低。

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Development of Luminescent Thin Films Based on Superlattice Structures of Al2O3 and ZnO by Atomic Layer Deposition

Thin films using ZnO and Al2O3 were fabricated by ALD. The crystallinity, surface roughness, spatial uniformity of the emission intensity and luminescence intensity were evaluated. As a result, the crystallinity, surface roughness, and spatial uniformity of the emission intensity improved as the Al2O3 layer was increased, but luminescence intensity decreased.

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2021 26th Microoptics Conference (MOC)

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