Large-area mask patterning for solar cell applications

Light harvesting using photonic crystal (PhC) surface patterns provides an opportunity to surpass the ray-optics defined light trapping and to approach thermodynamic ShockleyQueisser limit of solar cell efficiency, which for a single junction Si solar cell is ~ 32%. For an industry amenable nano-patterning of Si solar cells, we used laser direct write and stepper lithography based approaches for defining a large area (1 cm2) light trapping PhC patterns on silicon. Nanoholes of ~ 500 nm in diameter were fabricated by direct laser writing in a thin layer of chromium to act as a mask for subsequent reactive plasma etching to fabricate the nanostructures forming a PhC surface over a square centimeter. Surface area fabrication throughput was improved by more than order of magnitude as compared with electron beam lithography required to achieve sub-1 μm resolution.