300mm工具自动化及其对fab设计和OEE的影响

M. Weiss
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引用次数: 2

摘要

在300毫米时代建造晶圆厂的挑战将是最大限度地提高资本生产率。这一方向的一条道路是提高整体设备效率(OEE)。目前,提高OEE的方法包括重新设计工具,以提高可靠性、增加吞吐量、减少占用空间等。然而,300mm的开始为采用更广泛的系统方法来增加OEE提供了机会。本文通过分析批量尺寸选择、载体设计、工具布局、晶圆处理系统等对芯片制造前置时间(MLT)的影响,量化了物料处理对前端晶圆厂成本的影响。然后,本文确定了300毫米处理组件的设计选项,这些组件增加了晶圆在工艺工具中获得增值的时间,并减少了总体非增值处理时间。这为描述300mm晶圆厂工具和载体提供了基础,这些工具和载体被设计为一个整体系统,以提高整个晶圆厂的OEE或整体晶圆厂效率(OFE)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
300 mm tool automation and its impact on fab design and OEE
The challenge to building fabs in the 300 mm era will be to maximize the productivity of capital. One road in this direction is to increase Overall Equipment Effectiveness (OEE). At this time the approach being taken to increasing OEE involves the redesign of tools to improve reliability, increase throughput, reduce footprint, etc. The onset of 300 mm, however, presents an opportunity to take a more system wide approach at increasing OEE. In this paper we quantify the effects that material handling has on the cost of front end wafer fab by analyzing the effects that selection of batch size, carrier design, tool layout, wafer handling systems, etc. have on the Manufacturing Lead Time (MLT) of a chip. The paper then identifies design options for 300 mm handling components which increase the amount of time wafers spend getting value added in process tools, and decrease the overall non-value added handling times. This presents the basis for a description of a 300 mm fab tools and carriers which are designed as a total system to increase the OEE of the total fab, or the Overall Fab Effectiveness (OFE).
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