封面:第11908卷

{"title":"封面:第11908卷","authors":"","doi":"10.1117/12.2612386","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":277000,"journal":{"name":"Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Front Matter: Volume 11908\",\"authors\":\"\",\"doi\":\"10.1117/12.2612386\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":277000,\"journal\":{\"name\":\"Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-09-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2612386\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2612386","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}