Ar/Cl/sub - 2/化学辅助离子束蚀刻低损耗inp基光子晶体波导

Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551) Pub Date : 2001-09-30 DOI:10.1109/ECOC.2001.989035

M. Mulot, S. Anand, M. Swillo, M. Qiu, B. Jaskorzyńska, A. Talneau

{"title":"Ar/Cl/sub - 2/化学辅助离子束蚀刻低损耗inp基光子晶体波导","authors":"M. Mulot, S. Anand, M. Swillo, M. Qiu, B. Jaskorzyńska, A. Talneau","doi":"10.1109/ECOC.2001.989035","DOIUrl":null,"url":null,"abstract":"We demonstrate a loss of 1 dB/100 /spl mu/m in photonic crystal (PC) waveguides realized in a InP-based heterostructure by Ar/Cl/sub 2/ chemical assisted ion beam etching. The quality of PC etched with two different process conditions is compared by using the shape and the position of the mode-gap as an assessment tool.","PeriodicalId":408519,"journal":{"name":"Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-09-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Low loss InP-based photonic crystal waveguides etched with Ar/Cl/sub 2/ chemically assisted ion beam etching\",\"authors\":\"M. Mulot, S. Anand, M. Swillo, M. Qiu, B. Jaskorzyńska, A. Talneau\",\"doi\":\"10.1109/ECOC.2001.989035\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We demonstrate a loss of 1 dB/100 /spl mu/m in photonic crystal (PC) waveguides realized in a InP-based heterostructure by Ar/Cl/sub 2/ chemical assisted ion beam etching. The quality of PC etched with two different process conditions is compared by using the shape and the position of the mode-gap as an assessment tool.\",\"PeriodicalId\":408519,\"journal\":{\"name\":\"Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551)\",\"volume\":\"18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-09-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ECOC.2001.989035\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECOC.2001.989035","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 6

摘要

我们证明了通过Ar/Cl/sub - 2/化学辅助离子束刻蚀在inp基异质结构中实现光子晶体波导的损耗为1 dB/100 /spl mu/m。以模隙的形状和位置为评价工具，比较了两种不同工艺条件下PC刻蚀的质量。

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Low loss InP-based photonic crystal waveguides etched with Ar/Cl/sub 2/ chemically assisted ion beam etching

We demonstrate a loss of 1 dB/100 /spl mu/m in photonic crystal (PC) waveguides realized in a InP-based heterostructure by Ar/Cl/sub 2/ chemical assisted ion beam etching. The quality of PC etched with two different process conditions is compared by using the shape and the position of the mode-gap as an assessment tool.

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Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551)

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