优化衬底电极结构改善矩形直流磁控溅射中等离子体强度均匀性

Dong-Woo Ko, Se-Hwan Jang, Jae Hyun Kim, Kwan-Yong Lee, Young-Joo Kim
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Improvement on Plasma Intensity Uniformity in Rectangular DC Magnetron Sputter by Optimizing Structures of Substrate Electrode
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