CMOS 1/f 噪声建模和使用新提取程序提取 BSIM3 参数

J. Vildeuil, M. Valenza, D. Rigaud
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引用次数: 6

摘要

研究了0.8 /spl mu/m CMOS技术产生的一组晶体管的1/f噪声。测量结果与栅极和漏极偏差进行了分析。采用一种新的噪声提取方法提取了BSIM3模拟中所有操作区域的噪声参数。正如预期的那样,三个噪声参数(NOIA, NOIB和NOIC)可以模拟所有运行状态下的噪声。此外,对于所研究的晶体管,在饱和范围内,NOIC的贡献可以忽略不计。指出了BSIM3v3噪声模型的一些不准确之处;特别是,实验数据表明,对于n沟道mosfet, NOIB参数与V/sub GS/-V/sub T/相关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
CMOS 1/f noise modelling and extraction of BSIM3 parameters using a new extraction procedure
1/f noise is investigated in a set of transistors issued from a 0.8 /spl mu/m CMOS technology. Measurements have been analysed versus gate and drain biases. Noise parameters for BSIM3 simulation are extracted in all operating regions using a new extraction procedure. As expected, three noise parameters (NOIA, NOIB and NOIC) can model the noise in all operating regimes. Moreover, it is shown that for the studied transistors, the contribution of NOIC is neglible in the saturation range. Some inaccuracies of the BSIM3v3 noise model are pointed out; in particular, the experimental data indicates that for n-channel MOSFETs, the NOIB parameter is V/sub GS/-V/sub T/ dependent.
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