在光电导衰减测量分析中分离体积和表面寿命的技术

F. Giles, R. J. Schwartz
{"title":"在光电导衰减测量分析中分离体积和表面寿命的技术","authors":"F. Giles, R. J. Schwartz","doi":"10.1109/PVSC.1996.564230","DOIUrl":null,"url":null,"abstract":"Photoconductance decay measurements are frequently used to measure the lifetime of silicon wafers prior to processing and occasionally after various processing steps have been performed. It is an easy to use rapid measurement. However, the usual analysis of the data results in a determination of an \"effective\" lifetime which includes the effects of both bulk and surface recombination. This paper describes the measurement conditions and the analysis procedures which allow one to analyze photoconductance decay data to obtain the bulk lifetime and the surface recombination of the two surfaces rather than just the \"effective\" lifetime. Since the technique is contactless and does not require any additional processing or modification of the wafer, it is particularly promising as a process monitoring tool.","PeriodicalId":410394,"journal":{"name":"Conference Record of the Twenty Fifth IEEE Photovoltaic Specialists Conference - 1996","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A technique for separating bulk and surface lifetimes in the analysis of photoconductance decay measurements\",\"authors\":\"F. Giles, R. J. Schwartz\",\"doi\":\"10.1109/PVSC.1996.564230\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Photoconductance decay measurements are frequently used to measure the lifetime of silicon wafers prior to processing and occasionally after various processing steps have been performed. It is an easy to use rapid measurement. However, the usual analysis of the data results in a determination of an \\\"effective\\\" lifetime which includes the effects of both bulk and surface recombination. This paper describes the measurement conditions and the analysis procedures which allow one to analyze photoconductance decay data to obtain the bulk lifetime and the surface recombination of the two surfaces rather than just the \\\"effective\\\" lifetime. Since the technique is contactless and does not require any additional processing or modification of the wafer, it is particularly promising as a process monitoring tool.\",\"PeriodicalId\":410394,\"journal\":{\"name\":\"Conference Record of the Twenty Fifth IEEE Photovoltaic Specialists Conference - 1996\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-05-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Record of the Twenty Fifth IEEE Photovoltaic Specialists Conference - 1996\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PVSC.1996.564230\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Record of the Twenty Fifth IEEE Photovoltaic Specialists Conference - 1996","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.1996.564230","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

光导衰减测量经常用于测量硅晶片在加工前的寿命,偶尔也会在各种加工步骤完成后测量。它是一种易于使用的快速测量方法。然而,通常对数据的分析结果是确定“有效”寿命,其中包括体积和表面复合的影响。本文描述了分析光电导衰减数据的测量条件和分析程序,以获得体寿命和两个表面的表面复合,而不仅仅是“有效”寿命。由于该技术是非接触式的,不需要对晶圆片进行任何额外的处理或修改,因此它作为过程监控工具特别有前途。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A technique for separating bulk and surface lifetimes in the analysis of photoconductance decay measurements
Photoconductance decay measurements are frequently used to measure the lifetime of silicon wafers prior to processing and occasionally after various processing steps have been performed. It is an easy to use rapid measurement. However, the usual analysis of the data results in a determination of an "effective" lifetime which includes the effects of both bulk and surface recombination. This paper describes the measurement conditions and the analysis procedures which allow one to analyze photoconductance decay data to obtain the bulk lifetime and the surface recombination of the two surfaces rather than just the "effective" lifetime. Since the technique is contactless and does not require any additional processing or modification of the wafer, it is particularly promising as a process monitoring tool.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信