γ辐照对ZrO2薄膜亲水性自清洁性能及折射率依赖性的影响

D. Abayli, N. Baydogan
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引用次数: 2

摘要

采用溶胶-凝胶浸涂法制备ZrO2薄膜样品。对ZrO2薄膜施加了~ 0.4、0.7、1.2和2.7 Gray-Gy 4种不同的吸收剂量水平。因此,ZrO2薄膜的吸收剂量被检验为物理剂量,表示每单位质量的伽玛辐射传递给薄膜的平均能量。通过对ZrO2薄膜施加吸收剂量,可以灵敏地改变ZrO2薄膜的晶粒尺寸。因此辐照后的ZrO2薄膜的晶粒尺寸达到了~50 ~ 87 nm。研究了辐照ZrO2薄膜的晶粒尺寸、接触角和折射率之间的关系是一个重要的技术问题。辐照过程在热池中进行,使用0.018021 Ci的认证固体伽马射线源作为替代技术,以尽量减少额外毒性化学溶液的使用。通过改变ZrO2薄膜的晶粒尺寸,使辐照后的ZrO2薄膜的抗反射性能和亲水性略有提高。研究了ZrO2薄膜的光学性能和结构性能,以获得最佳的高折射率、自清洁和抗反射性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The variations of hydrophilic self-cleaning properties and refractive index dependence in the ZrO2 thin films by gamma irradiation
ZrO2 thin film samples were produced by the sol-gel dip coating method. Four different absorbed dose levels (such as ~ 0.4, 0.7, 1.2 and 2.7 Gray-Gy) were applied to ZrO2 thin films. Hence the absorbed dose of ZrO2 thin film was examined as physical dose quantity representing the mean energy imparted to the thin film per unit mass by gamma radiation. Modification of the grain size was performed sensitively by the application of the absorbed dose to the ZrO2 thin film.Therefore the grain size reached from ~50 nm to 87 nm at the irradiated ZrO2 thin film. The relationship of the grain size, the contact angle, and the refractive index of the irradiated ZrO2 thin film was investigated as being an important technical concern. The irradiation process was performed in a hot cell by using a certified solid gamma ray source with 0.018021 Ci as an alternative technique to minimize the utilization of extra toxicological chemical solution.Antireflection and hydrophilic properties of the irradiated ZrO2 thin film were slightly improved by the modification of the grain size. The details on the optical and structural properties of the ZrO2 thin film were examined to obtain theoptimum high refractive index, self-cleaning and antireflectiveproperties.
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