Hostaflon TFM“第二代”含氟聚合物，改善污染控制

Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI:10.1109/IEMT.1996.559734

M. Schlipf, G. Lohr, K. Hintzer, J. Abate, R. Spell

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引用次数: 0

摘要

聚四氟乙烯(PTFE)和全氟化氟热塑料，如PFA，是四氟乙烯与约4%的全氟烷基乙烯醚的共聚物，已成为半导体制造机械中关键化学和气体界面组件的首选材料。Hostaflon TFM，第二代PTFE，在半导体应用中以非改性PTFE无法实现的方式补充PFA。本文确定了在半导体制造业中使用的Hostaflon TFM组件的污染控制和可靠性的好处。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Hostaflon TFM "second generation" fluoropolymer for improved contamination control

Polytetrafluoroethylene (PTFE) and per-fluorinated fluorothermoplastics such as PFA, a copolymer of tetrafluoroethylene with some 4 wt% perfluoroalkylvinylether, have become materials of choice in semiconductor manufacturing machinery for critical chemical and gas interface components. Hostaflon TFM, the 2nd generation PTFE, complements PFA in semiconductor applications in a way that cannot be achieved by non-modified PTFE. This paper identifies the benefits in contamination control and reliability of Hostaflon TFM components used in the semiconductor manufacturing industry.

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来源期刊

Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium

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