SiGeSn合金的合成、性能及应用:现状与展望

J. Menéndez
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摘要

1991年,Soref和Perry发表了一篇概念论文,介绍了一种用于硅兼容光电应用的假想三元Ge1-x-ySixSny合金的性质。这种材料最终于2003年在亚利桑那州立大学合成,开辟了一个新的研究领域,并迅速发表了1000篇论文。Wirths、Buca和Mantl最近发表的一篇评论文章详细描述了这一进展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Synthesis, properties, and applications of SiGeSn alloys: State of the art and future prospects
In 1991, Soref and Perry presented a concept paper on the properties of a hypothetical ternary Ge1-x-ySixSny alloy for silicon-compatible optoelectronic applications. The material was finally synthesized at Arizona State University in 2003, opening up a new field of research that is rapidly approaching its first one-thousand publications. A very recent review article by Wirths, Buca, and Mantl provides a detailed account of this progress.
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