金催化剂厚度对氧化锌薄膜的影响

S. S. Shariffudin, M. Musa, M. H. Mamat, M. Rusop
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引用次数: 2

摘要

以金为催化剂,采用热化学气相沉积(TCVD)技术在双炉系统中制备ZnO薄膜。本研究采用碳热技术,将石墨以1:1的比例混合到ZnO粉末中作为前驱体。在基底上沉积不同厚度的金,研究其对薄膜性能的影响。然后利用场发射扫描电镜(FE-SEM)、光致发光(PL)和电流-电压(I-V)测量对ZnO纳米结构进行了表征。讨论了催化剂厚度对ZnO纳米结构形貌、电学性能及光致发光性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Gold catalyst thickness on Zinc Oxide thin films
ZnO thin films were deposited using thermal chemical vapor deposition (TCVD) using gold as the catalyst in a two furnaces system. Carbothermal technique is employed in this work where graphite was mixed into ZnO powder with 1:1 ratio as the precursor. Different thicknesses of gold were deposited on the substrate to study its effect to the properties of the thin films. The ZnO nanostructures were then characterized using field emission scanning electron microscopy (FE-SEM), photoluminescence (PL) measurement, and current-voltage (I-V) measurement. Influence of the catalyst thicknesses on the morphology, electrical properties and photoluminescence of ZnO nanostructures is discussed.
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