基于扩展伏特拉序列分析的氮化镓HEMT中IMD3的研究

E. R. Srinidhi, G. Kompa
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引用次数: 4

摘要

本文主要侧重于为可能的GaN器件线性度改进提供理论依据,解释IMD3的关键物理起源。基于无场极板的8x125 mum GaN HEMT的偏置相关s参数测量数据,利用经典Volterra级数理论建立了IMD3模型。因此,通过这种技术进行器件诊断,以有效地定位畸变行为。此外,利用场极板技术适当调整栅漏反馈电容可以改善器件的线性度,证明该分析是开发GaN HEMT技术的有力工具。此外,随着对IMD零化的深入理解,Volterra分析扩展到五度非线性,从而深入了解畸变抵消机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of IMD3 in GaN HEMT based on extended volterra series analysis
This paper mainly focuses on providing theoretical justification for possible GaN device linearity improvement, interpretating key physical origins of IMD3. Based on bias dependent S-parameter measurement data of field-plate-free 8x125 mum GaN HEMT, IMD3 is modelled using classical Volterra series theory. Device diagnosis is hence carried out, by means of this technique, for efficiently localizing the distortion behaviour. Further, device linearity is shown to improve by appropriately tuning gate-drain feedback capacitance by taking advantage of field-plate technology proving the analysis to be a powerful tool for developing GaN HEMT technology. Further, with the intension of understanding IMD nulling, Volterra analysis is extended to 5th-degrce nonlinearity through which an insight into the distortion cancellation mechanism is obtained.
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