Ge-Te合金相变薄膜的制备及其短波光存储性能

Huiyong Liu, F. Jiang, L. Men, Z. Fan, F. Gan
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引用次数: 0

摘要

报道了锗碲合金相变薄膜的制备方法及其短波光存储性能。采用射频溅射技术制备薄膜。沉积的薄膜是无定形的。结晶温度为190℃。光谱测量结果表明,该晶体态薄膜在780 nm处具有较高的反射率,约为50%,适合作为CD-E存储介质。采用静态光记录测试仪,用聚焦氩激光(514.5 nm)照射在薄膜上,对薄膜的光存储性能进行了评价。结果表明,在低功率光束下可以获得较大的反射率对比度(大于15%)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Preparation and short-wavelength optical storage properties of Ge-Te alloy phase change thin film
The preparation method and short-wavelength optical storage properties of Ge-Te alloy phase change thin film are reported. The film was prepared by rf-sputtering technology. The deposited films were amorphous. The crystallization temperature was 190 degrees Celsius. The optical spectrum measurements showed that the reflectivity of the crystalline state film was rather high -- about 50% at 780 nm, which may be suitable for CD-E storage medium. A static optical recording tester with a focused Argon laser beam (514.5 nm) irradiating on the films was used to evaluate the optical storage performance of the films. The results showed that a rather large reflectivity contrast (larger than 15%) can be obtained at low power beam.
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