{"title":"Ge-Te合金相变薄膜的制备及其短波光存储性能","authors":"Huiyong Liu, F. Jiang, L. Men, Z. Fan, F. Gan","doi":"10.1117/12.300711","DOIUrl":null,"url":null,"abstract":"The preparation method and short-wavelength optical storage properties of Ge-Te alloy phase change thin film are reported. The film was prepared by rf-sputtering technology. The deposited films were amorphous. The crystallization temperature was 190 degrees Celsius. The optical spectrum measurements showed that the reflectivity of the crystalline state film was rather high -- about 50% at 780 nm, which may be suitable for CD-E storage medium. A static optical recording tester with a focused Argon laser beam (514.5 nm) irradiating on the films was used to evaluate the optical storage performance of the films. The results showed that a rather large reflectivity contrast (larger than 15%) can be obtained at low power beam.","PeriodicalId":362287,"journal":{"name":"Thin Film Physics and Applications","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Preparation and short-wavelength optical storage properties of Ge-Te alloy phase change thin film\",\"authors\":\"Huiyong Liu, F. Jiang, L. Men, Z. Fan, F. Gan\",\"doi\":\"10.1117/12.300711\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The preparation method and short-wavelength optical storage properties of Ge-Te alloy phase change thin film are reported. The film was prepared by rf-sputtering technology. The deposited films were amorphous. The crystallization temperature was 190 degrees Celsius. The optical spectrum measurements showed that the reflectivity of the crystalline state film was rather high -- about 50% at 780 nm, which may be suitable for CD-E storage medium. A static optical recording tester with a focused Argon laser beam (514.5 nm) irradiating on the films was used to evaluate the optical storage performance of the films. The results showed that a rather large reflectivity contrast (larger than 15%) can be obtained at low power beam.\",\"PeriodicalId\":362287,\"journal\":{\"name\":\"Thin Film Physics and Applications\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-02-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Thin Film Physics and Applications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.300711\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Film Physics and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.300711","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Preparation and short-wavelength optical storage properties of Ge-Te alloy phase change thin film
The preparation method and short-wavelength optical storage properties of Ge-Te alloy phase change thin film are reported. The film was prepared by rf-sputtering technology. The deposited films were amorphous. The crystallization temperature was 190 degrees Celsius. The optical spectrum measurements showed that the reflectivity of the crystalline state film was rather high -- about 50% at 780 nm, which may be suitable for CD-E storage medium. A static optical recording tester with a focused Argon laser beam (514.5 nm) irradiating on the films was used to evaluate the optical storage performance of the films. The results showed that a rather large reflectivity contrast (larger than 15%) can be obtained at low power beam.