纳米CMOS技术中的模拟IC设计

W. Sansen
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引用次数: 8

摘要

在纳米CMOS技术中,出现了一些新的效应,如速度饱和和栅漏电流。结果,跨导和速度都受到速度饱和的限制。由于使用了更薄的栅极氧化物,噪声和失配也会受到影响。此外,电源电压降低到1伏特以下,为模拟电路设计带来了新的挑战。本文介绍了模型参数的修改,包括噪声和失真。其次是对现有电路模块(如米勒运算放大器和Gm-C滤波器)中的噪声/功率折衷的探索。概述了低压放大器/滤波器配置与门和批量驱动器。最后讨论了几种亚1伏电路的不同应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analog IC Design in Nanometer CMOS Technologies
In nanometer CMOS technologies, several new effects emerge, such as velocity saturation and gate leakage currents. As a result the transconductance and speed are both limited by velocity saturation. Also noise and mismatch are affected as a result of the thinner gate oxides used. Moreover the supply voltage is reduced to values below 1 Volt, creating new challenges for analog circuit design. This presentation provides a review of the modifications in model parameters, including noise and distortion. It is followed by an exploration of the noise/power compromise in existing circuit blocks such as Miller operational amplifiers and Gm-C filters. An overview is the given of low-voltage amplifiers/filters configurations with both Gate and Bulk drives. Several sub-1 Volt circuits are finally discussed for different applications.
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