改进蚀刻工艺制备Nb2O5水平槽波导

2021 26th Microoptics Conference (MOC) Pub Date : 2021-09-26 DOI:10.23919/MOC52031.2021.9598139

Takumi Hinata, Y. Hayama, Naoki Sawayanagi, Tasuku Touma, K. Nakatsuhara, Masayuki Takeda, T. Nishizawa

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引用次数: 0

摘要

我们改进了Nb2O5水平槽波导的干刻蚀工艺，以抑制蚀刻表面的粗糙度。我们还利用改进的工艺制作了水平槽波导。在所制备的波导中，成功地获得了光滑的蚀刻表面和透射光。

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Nb2O5 horizontal slot waveguides fabricated by an improved etching process

We improved the dry-etching process for Nb2O5 horizontal slot waveguides to suppress roughness in etched surfaces. We have also fabricated horizontal slot waveguides by the improved process. In the fabricated waveguides, the smooth etched surface and the transmitted light were successfully obtained.

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来源期刊

2021 26th Microoptics Conference (MOC)

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