放电镀膜法制备含硅非晶层的研究

Nobuyuki Sumi, A. Goto, H. Teramoto, Yusuke Yasunaga, Y. Nakano
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引用次数: 13

摘要

硅电极电火花加工表面形成非晶层,具有优异的耐腐蚀性能。在本研究中,通过放电镀膜形成了较厚(约10μm)的含硅非晶层,并对该非晶层的特性进行了研究。结果表明,含硅非晶层除具有优异的耐蚀性外,还具有优异的耐冲蚀性。此外,详细的金相分析表明,含硅非晶层中存在细小的结晶组织。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of Si-containing amorphous layer by electrical discharge coating
Electrical discharge machined surface using Si electrode has excellent corrosion resistance because of the formation of an amorphous layer. In this study, Si-containing amorphous layer which was comparatively thick (about 10μm) was formed by electrical discharge coating, and the characteristics of this layer were investigated. As a result, it was revealed that the Si-containing amorphous layer had excellent erosion resistance in addition to excellent corrosion resistance. Moreover, detailed metallographic analyses showed that fine structures with crystalline existed in the Si-containing amorphous layer.
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