改变Al摩尔分数对InGaAlAs-InP DBRTD性能的影响

C. Lim, S. J. Chua, G. Karunasiri
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引用次数: 0

摘要

本文研究了与InP衬底相匹配的双势垒谐振隧道二极管(DBRTD)的接触层、势垒层和阱层中InAlGaAs合金成分的变化对透射曲线和峰谷电流比(PVCD)的影响。模拟中使用了一个简单的RTD模型,其中假定施加的偏置在双势垒区域下降。采用Airy函数形式求解结构中的薛定谔方程,采用传递矩阵法计算传输系数,并利用传输系数计算Tsu和Esaki隧穿电流。结果表明,In/sub 0.52/Al/sub 0.48/As势垒和In/sub 0.52/Al/sub 0.48/As以及接触的rtd性能最好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of changing Al mole fraction on the performance of an InGaAlAs-InP DBRTD
The effects of changing the InAlGaAs alloy composition in the contact, barrier and well layers of a double barrier resonant tunnelling diode (DBRTD), lattice-matched to the InP substrate, on the transmission curves and the peak-to-valley current ratio (PVCD) have been studied. A simple RTD model, in which the applied bias is assumed to drop across the double barrier region, is used in the simulation. The Airy function formalism is used to solve the Schrodinger equation in the structure and the transfer matrix method is used to calculate the transmission coefficient, which is then used to calculate the Tsu and Esaki tunnelling current. It is found that among all the structures studied, RTDs with In/sub 0.52/Al/sub 0.48/As barriers and In/sub 0.52/Al/sub 0.48/As well and contact have the best performance.
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