100nm GaN-on-Si HEMTs的窄脉宽双脉冲s参数测量

A. M. Angelotti, Gian Piero Gibiin, C. Florian, A. Santarelli
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引用次数: 0

摘要

电荷捕获引起的氮化镓HEMT色散现象可以通过脉冲IV测量有效地表征。在这项工作中,我们利用该装置的宽带特性,在几百ns的窄脉冲宽度内获得脉冲s参数测量。然后,我们通过OMMIC报告了100 nm GaN-on-Si HEMT技术的单脉冲和双脉冲s参数表征,显示了陷阱对小信号参数的影响,并为紧凑模型识别提供了重要数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Narrow-pulse-width double-pulsed S-parameters measurements of 100-nm GaN-on-Si HEMTs
GaN HEMT dispersive phenomena due to charge trapping can be effectively characterized by means of pulsed IV measurements. In this work, we exploit the wideband feature of the setup obtaining pulsed S-parameters measurements within narrow pulse widths, in the order of a few hundred ns. Then, we report the single and double-pulsed S-parameters characterization of the 100-nm GaN-on-Si HEMT technology by OMMIC, showing the impact of traps on the small-signal parameters and providing significant data for compact model identification.
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