具有交错沟槽的高方向性光纤芯片光栅耦合器的首次实验演示

D. Benedikovic, C. Alonso‐Ramos, P. Cheben, J. Schmid, Shurui Wang, Danxia Xu, R. Halir, A. Ortega-Moñux, J. Fédéli, S. Janz, Í. Molina-Fernández, M. Dado
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引用次数: 1

摘要

我们提出了一种新的光纤芯片光栅耦合器概念的第一个实验演示,该概念通过交错的深和浅蚀刻沟来利用燃烧效应来最大化定向性。采用193nm深紫外光刻技术和电子束光刻技术制备光栅耦合器。测量到的光纤芯片耦合效率峰值为-1.8 dB,波长为1550 nm,带宽为3db,带宽为52 nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
First experimental demonstration of high-directionality fiber-chip grating coupler with interleaved trenches
We present the first experimental demonstration of a new fiber-chip grating coupler concept that exploits the blazing effect by interleaving deep and shallow etch trenches to maximize directionality. The grating couplers were fabricated using both 193 nm deep-ultraviolet lithography and electron beam lithography. The measured peak fiber-chip coupling efficiency is -1.8 dB at a wavelength of 1550 nm, with a 3 dB bandwidth of 52 nm.
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