数字光处理立体光刻制备微流控特征的实验研究

Lara Rebaioli, I. Fassi
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引用次数: 1

摘要

芯片实验室(loc)是一种主要基于微流体的设备,它允许在单个芯片上以小型化的形式执行一种或几种化学、生化或生物分析。增材制造工艺,特别是数字光处理立体光刻(DLP-SLA),可以在一个步骤中快速生产具有高分辨率3D特征的完整LOC,即不需要组装过程,并且使用低成本和用户友好的桌面机器。然而,DLP-SLA产生非平面通道或具有复杂截面的通道的潜力尚未得到充分研究。本研究提出了一个基准伪像(也包括一些轴位于与机器制造平台平行的平面上的通道),旨在评估DLP-SLA制造微流控器件微特征的能力和性能。进行了适当的实验活动,以评估主要工艺参数(即层厚度和曝光时间)对工艺性能的影响。结果表明,工艺参数对所分析的工件的质量和尺寸精度都有影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental Investigation of Microfluidic Feature Manufacturing by Digital Light Processing Stereolithography
Lab on Chips (LOCs) are devices, mostly based on microfluidics, that allow to perform one or several chemical, biochemical or biological analysis in a miniaturized format on a single chip. The Additive Manufacturing processes, and in particular the Digital Light Processing stereolithography (DLP-SLA), could quickly produce a complete LOC with high resolution 3D features in a single step, i.e. without the need for assembly processes, and using low cost and user-friendly desktop machines. However, the potential of DLP-SLA to produce non-planar channels or channels with complex sections has not been fully investigated yet. This study proposes a benchmark artifact (including also some channels with their axis lying in a plane parallel to the machine building platform) aiming at assessing the capability and performance of DLP-SLA for manufacturing microfeatures for microfluidic devices. A proper experimental campaign was performed to evaluate the effect of the main process parameters (namely, layer thickness and exposure time) on the process performance. The results pointed out that both the process parameters influence the quality and dimensional accuracy of the analyzed features.
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