{"title":"基于雪崩晶体管的重复纳秒脉冲发生器在等离子射流中的应用","authors":"S. Shen, Jiaqi Yan, Guoxiang Sun, W. Ding","doi":"10.1109/ICOPS37625.2020.9717853","DOIUrl":null,"url":null,"abstract":"Atmospheric pressure plasma jet (APPJ) is a gas discharge phenomenon in which the active particles generated in the discharge space are transmitted to the atmospheric environment under the combined action of electric field and flow field. Its flexibility and maneuverability make it more suitable for dealing with uneven surfaces and complex 3D materials, so that it has been widely used in the fields of material modification, surface sterilization and film deposition[1]. The generating conditions and characteristics of APPJ are closely related to the driving source. Compared with the discharge under conventional AC and DC driving sources, discharge under nanosecond pulse can provide higher power density and higher E / N due to its ultra-fast rise time. It promotes the reactions that cannot be achieved under conventional conditions and is more favorable for the generation of APPJ [2].","PeriodicalId":122132,"journal":{"name":"2020 IEEE International Conference on Plasma Science (ICOPS)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Application of Repetitive Nanosecond Pulse Generator Based on Avalanche Transistors in Plasma Jet\",\"authors\":\"S. Shen, Jiaqi Yan, Guoxiang Sun, W. Ding\",\"doi\":\"10.1109/ICOPS37625.2020.9717853\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Atmospheric pressure plasma jet (APPJ) is a gas discharge phenomenon in which the active particles generated in the discharge space are transmitted to the atmospheric environment under the combined action of electric field and flow field. Its flexibility and maneuverability make it more suitable for dealing with uneven surfaces and complex 3D materials, so that it has been widely used in the fields of material modification, surface sterilization and film deposition[1]. The generating conditions and characteristics of APPJ are closely related to the driving source. Compared with the discharge under conventional AC and DC driving sources, discharge under nanosecond pulse can provide higher power density and higher E / N due to its ultra-fast rise time. It promotes the reactions that cannot be achieved under conventional conditions and is more favorable for the generation of APPJ [2].\",\"PeriodicalId\":122132,\"journal\":{\"name\":\"2020 IEEE International Conference on Plasma Science (ICOPS)\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-12-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE International Conference on Plasma Science (ICOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICOPS37625.2020.9717853\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International Conference on Plasma Science (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICOPS37625.2020.9717853","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Application of Repetitive Nanosecond Pulse Generator Based on Avalanche Transistors in Plasma Jet
Atmospheric pressure plasma jet (APPJ) is a gas discharge phenomenon in which the active particles generated in the discharge space are transmitted to the atmospheric environment under the combined action of electric field and flow field. Its flexibility and maneuverability make it more suitable for dealing with uneven surfaces and complex 3D materials, so that it has been widely used in the fields of material modification, surface sterilization and film deposition[1]. The generating conditions and characteristics of APPJ are closely related to the driving source. Compared with the discharge under conventional AC and DC driving sources, discharge under nanosecond pulse can provide higher power density and higher E / N due to its ultra-fast rise time. It promotes the reactions that cannot be achieved under conventional conditions and is more favorable for the generation of APPJ [2].