CO2激光光滑法对熔融石英表面粗糙度的建模与分析

Xinyu Luo, Wei Yang, Yaguo Li
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引用次数: 0

摘要

通过仿真和实验研究了CO2激光光顺熔融二氧化硅以获得光滑表面的方法。对熔融石英的微流动平滑进行了数值模拟。实验中考虑了P(激光功率)、v(扫描速度)和d(扫描路径间距)等工艺参数对激光辐照后表面粗糙度Ra的影响。结果表明:当P=35W, v=0.2mm/s, d=1.0mm时,表面粗糙度从183.6nm迅速降低到14.27nm,获得了光滑的表面;另一方面,在不合适的参数(P=30W或v=0.5mm/s或d=2.0mm)下,表面会出现光栅结构。光栅结构对表面粗糙度的影响范围为~40nm ~ ~140nm, P=30W时为140.9nm, v=0.5mm/s时为71.6nm, d=2.0mm时为41.3nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling and analysis of surface roughness in fused silica by CO2 laser smoothing
The research of CO2 laser smoothing fused silica to achieve smooth surface was investigated by simulations and experiments. Micro-flow smoothing of fused silica was numerically simulated. In the experiments, the influence of processing parameters, such as P (laser power), v (scanning velocity) and d (scanning path pitch) were taken into account on surface roughness (Ra) after laser irradiation. The results show that the roughness is rapidly reduced from 183.6nm to 14.27nm under P=35W, v=0.2mm/s, d=1.0mm, and thus the smooth surface is obtained. On the other hand, the raster structure will appear on the surface at inappropriate parameters (P=30W or v=0.5mm/s or d=2.0mm). The surface roughness highly influenced by raster structure ranges from ~40nm to ~140nm, 140.9nm for P=30W, 71.6nm for v=0.5mm/s, 41.3nm for d=2.0mm.
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