RTP用强力涡流稳定水壁闪光灯的研制

Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting. Pub Date : 2004-11-01 DOI:10.1109/IAS.2004.1348538

T. Thrum, D. Camm, S. Dets, A. Hewett, I. Rudic, G. Stuart, A. Viel

{"title":"RTP用强力涡流稳定水壁闪光灯的研制","authors":"T. Thrum, D. Camm, S. Dets, A. Hewett, I. Rudic, G. Stuart, A. Viel","doi":"10.1109/IAS.2004.1348538","DOIUrl":null,"url":null,"abstract":"A 300 mm long flash lamp based on a water-vortex stabilized high-pressure high-power arc lamp has been developed to meet future requirements in semiconductor rapid thermal processing. This flash lamp is much more powerful than any other commercially available flash lamp. Typical operating parameters are peak currents of up to 50 kA and pulse widths in the order of 0.5 to 2 ms FWHM.","PeriodicalId":131410,"journal":{"name":"Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting.","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Development of a powerful vortex stabilized waterwall flash lamp for RTP applications\",\"authors\":\"T. Thrum, D. Camm, S. Dets, A. Hewett, I. Rudic, G. Stuart, A. Viel\",\"doi\":\"10.1109/IAS.2004.1348538\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A 300 mm long flash lamp based on a water-vortex stabilized high-pressure high-power arc lamp has been developed to meet future requirements in semiconductor rapid thermal processing. This flash lamp is much more powerful than any other commercially available flash lamp. Typical operating parameters are peak currents of up to 50 kA and pulse widths in the order of 0.5 to 2 ms FWHM.\",\"PeriodicalId\":131410,\"journal\":{\"name\":\"Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting.\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IAS.2004.1348538\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IAS.2004.1348538","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 9

摘要

为满足未来半导体快速热加工的要求，研制了一种基于水涡稳定高压大功率电弧灯的300mm长闪光灯。这种闪光灯比任何其他市售的闪光灯都要强大得多。典型的工作参数是高达50 kA的峰值电流和0.5至2 ms FWHM的脉冲宽度。

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Development of a powerful vortex stabilized waterwall flash lamp for RTP applications

A 300 mm long flash lamp based on a water-vortex stabilized high-pressure high-power arc lamp has been developed to meet future requirements in semiconductor rapid thermal processing. This flash lamp is much more powerful than any other commercially available flash lamp. Typical operating parameters are peak currents of up to 50 kA and pulse widths in the order of 0.5 to 2 ms FWHM.

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Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting.

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