基于InGaAs pHEMT的紧凑高效宽带可变增益LNA MMIC

Umar Dilshad, Chen Chen, J. Miao
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引用次数: 2

摘要

本文介绍了一种工作在4- 10ghz频段的宽带可变增益低噪声放大器(VGLNA) MMIC的设计。MMIC采用WIN半导体公司的0.15um InGaAs伪晶高电子迁移率晶体管(pHEMPT)工艺设计和制造。该设计由两级放大器组成:第一级为恒增益、低噪声级,第二级为变增益级。为了在宽带宽下实现平坦增益,两个阶段都采用了RC反馈拓扑。实测结果与仿真结果吻合较好。VGLNA MMIC的实测增益为19 dB,噪声系数为2.5 dB。在4 - 10 GHz范围内实现了优于±0.7 dB的增益平坦度,对应于85%的极宽平坦增益带宽。测量的输入输出回波损耗在整个频带内均小于10 dB。增益由外部直流控制电压控制。对应于0 ~ 3V的控制电压变化,实现了大于20db的增益变化范围。1db压缩点对应的最大输出功率为+ 2dbm。芯片在+3V直流电源电压下消耗60mA标称直流电流;这相当于180mW的极低直流功耗。VGLNA MMIC仅使用两个有源p-HEMT器件,占用的制造面积为1.5 mm x 0.8 mm;对于这个电路来说是非常紧凑的。据我们所知,在这个频率范围内,这些性能参数是迄今为止在GaAs pHEMT上开发的可变增益LNA MMIC中报道的最好的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Compact and Efficient Wideband Variable Gain LNA MMIC on InGaAs pHEMT
In this paper, the design of wide-band variable gain low noise amplifier (VGLNA) MMIC operating in 4-10 GHz frequency range has been presented. The MMIC has been designed and fabricated on 0.15um InGaAs pseudomorphic high electron-mobility transistor (pHEMPT) process from WIN Semiconductors Corporation. The proposed design consists of two amplifier stages: First stage is constant gain, low noise stage whereas the second stage is variable gain stage. In order to achieve flat gain in wide bandwidth, RC feedback topology is used in both the stages. The measured results show good agreement with the simulation results. The measured Gain of the VGLNA MMIC is 19 dB and the noise figure is 2.5 dB. Gain flatness of better than ±0.7 dB is achieved from 4 to 10 GHz, which corresponds to extremely wide flat gain bandwidth of 85%. The measured input and output return losses are better than 10 dB in the whole frequency band. The Gain is controllable by external DC control voltage. Gain variation range of more than 20 dB is achieved corresponding to control voltage variation from 0 to 3V. The maximum output power, corresponding to 1-dB compression point is +2 dBm. The chip consumes 60mA nominal DC current at +3V DC supply voltage; which corresponds to very low DC power consumption of 180mW. The VGLNA MMIC only utilizes two active p-HEMT devices and the occupied fabrication area is 1.5 mm x 0.8 mm; which is quite compact for this circuit. To our knowledge, these performance parameters are among the best reported up till now for variable gain LNA MMIC developed on GaAs pHEMT, in this frequency range.
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