{"title":"具有边缘粗糙度效应的石墨烯纳米带场效应晶体管器件性能的计算研究","authors":"Z. Leong, K. Lam, G. Liang","doi":"10.1109/IWCE.2009.5091104","DOIUrl":null,"url":null,"abstract":"The device performance of armchair edge graphene nanoribbon Schottky barrier field effect transistors (A-GNR SBFETs) over different edge roughness and widths are investigated over a wide range of devices in terms of I ON /I OFF . Generally, wider GNRs outperform narrower GNRs in the presence of edge roughness effects with average leakage current reduced up to ~400% less. The average leakage current for 2.2 nm width GNR SBFETs increased 2.7 times when edge roughness increased from 5% to 10%, while the same for 1.4 nm widths increased 11.2 times In addition, a small amount of ER of 5% is well tolerated by all GNR SBFETs, with the average I ON /I OFF lowered from 4012 to 3075 for 1.4 nm widths. However, a further increase in ER to 20% degrades performance greatly, dropping I ON /I OFF to 273. The generally reliable performance of GNR SBFETs at small edge irregularities over channel widths is reported and a detailed statistical investigation provided.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Device Performance of Graphene Nanoribbon Field Effect Transistors with Edge Roughness Effects: A Computational Study\",\"authors\":\"Z. Leong, K. Lam, G. Liang\",\"doi\":\"10.1109/IWCE.2009.5091104\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The device performance of armchair edge graphene nanoribbon Schottky barrier field effect transistors (A-GNR SBFETs) over different edge roughness and widths are investigated over a wide range of devices in terms of I ON /I OFF . Generally, wider GNRs outperform narrower GNRs in the presence of edge roughness effects with average leakage current reduced up to ~400% less. The average leakage current for 2.2 nm width GNR SBFETs increased 2.7 times when edge roughness increased from 5% to 10%, while the same for 1.4 nm widths increased 11.2 times In addition, a small amount of ER of 5% is well tolerated by all GNR SBFETs, with the average I ON /I OFF lowered from 4012 to 3075 for 1.4 nm widths. However, a further increase in ER to 20% degrades performance greatly, dropping I ON /I OFF to 273. The generally reliable performance of GNR SBFETs at small edge irregularities over channel widths is reported and a detailed statistical investigation provided.\",\"PeriodicalId\":443119,\"journal\":{\"name\":\"2009 13th International Workshop on Computational Electronics\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-05-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 13th International Workshop on Computational Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IWCE.2009.5091104\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 13th International Workshop on Computational Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWCE.2009.5091104","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
摘要
研究了扶手椅边缘石墨烯纳米带肖特基势垒场效应晶体管(a - gnr sbfet)在不同边缘粗糙度和宽度下的器件性能。一般来说,在边缘粗糙度的影响下,更宽的gnr比更窄的gnr性能更好,平均泄漏电流减少了400%。当边缘粗糙度从5%增加到10%时,2.2 nm宽度的GNR sbfet的平均泄漏电流增加了2.7倍,而1.4 nm宽度的GNR sbfet的平均泄漏电流增加了11.2倍。此外,所有GNR sbfet都能很好地耐受5%的少量ER,平均I ON /I OFF从4012降低到3075。但是,ER进一步增加到20%会大大降低性能,使I ON /I OFF降至273。报告了GNR sbfet在沟道宽度上的小边缘不规则情况下的一般可靠性能,并提供了详细的统计调查。
Device Performance of Graphene Nanoribbon Field Effect Transistors with Edge Roughness Effects: A Computational Study
The device performance of armchair edge graphene nanoribbon Schottky barrier field effect transistors (A-GNR SBFETs) over different edge roughness and widths are investigated over a wide range of devices in terms of I ON /I OFF . Generally, wider GNRs outperform narrower GNRs in the presence of edge roughness effects with average leakage current reduced up to ~400% less. The average leakage current for 2.2 nm width GNR SBFETs increased 2.7 times when edge roughness increased from 5% to 10%, while the same for 1.4 nm widths increased 11.2 times In addition, a small amount of ER of 5% is well tolerated by all GNR SBFETs, with the average I ON /I OFF lowered from 4012 to 3075 for 1.4 nm widths. However, a further increase in ER to 20% degrades performance greatly, dropping I ON /I OFF to 273. The generally reliable performance of GNR SBFETs at small edge irregularities over channel widths is reported and a detailed statistical investigation provided.