电沉积铜镀层的织构与亚结构、颗粒结构和表面形貌的关系

O. Girin, Yu. O. Proshenko, E. P. Kalinushkin
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引用次数: 5

摘要

本文介绍了电沉积铜镀层的晶体织构及其亚结构、颗粒结构和表面形貌的综合研究结果。涉及子结构特征各向异性的定量织构评价,以及子结构和颗粒结构特征在轴向和随机组件中的确定。讨论了铜层中子结构的织构各向异性和颗粒结构的织构非均匀性的影响。讨论了沉积电流密度对铜矿定向结构定量特征的影响。考虑了各种热力学因素对铜电镀层织构形成的影响,包括织构主要成分晶粒的成核和长大两个阶段。对铜镀层中取向结构元素的形状各向异性进行了研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Texture of Electrodeposited Copper Coatings as Related to TheirSubstructure, Granular Structure and Surface Morphology
Results of comprehensive studies into crystallographic texture of electrodeposited copper coatings are presented in relation to their substructure, granular structure and surface morphology. Quantitative texture evaluation involving anisotropy of substructure characteristics, and determination of characteristics of substructure and granular structure in the axial and random components are addressed. Effects of texture anisotropy of substructure and texture nonhomogeneity of granular structure discovered in copper layers are dealt with. Influence of the deposition current density on quantitative characteristics of oriented structure in copper deposits is discussed. The effects of various thermodynamic factors on texture formation in copper electroplates are considered for the stages of (i) nucleation and (ii) growth of grains in the major component of texture. Anisotropy of shape is also treated for the elements of oriented structure in copper electrodeposits.
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