多发射极SiGe HBTs的加热

S. Mcalister, W. Mckinnon, S. Kovacic, H. Lafontaine
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引用次数: 0

摘要

采用具有多个发射极的双极晶体管来实现大电流和最大限度地利用发射极面积。研究了采用改进的Si BiCMOS技术制备多发射极SiGe HBTs。测量了多发射极SiGe HBT发射极之间沿发射极长度方向的加热和热耦合。该测量提供了有关多发射极器件温度升高和发射极-发射极热耦合的有用信息。通过实验研究了归一化发射极电流的温度依赖性和被监测发射极电流的功率依赖性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Heating in multi-emitter SiGe HBTs
Bipolar transistors with multiple emitters are used to achieve high currents and the maximum utilization of emitter area. The multi-emitter SiGe HBTs fabricated in a modified Si BiCMOS technology is studied in this paper. The heating and thermal coupling between the emitters of a multiple emitter SiGe HBT were measured along the emitter length. This measurement provides useful information about the temperature increases in multi-emitter devices and the emitter-emitter thermal coupling. Temperature dependence of the normalized emitter currents and power dependence of the monitored emitter currents were studied through experiments.
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