MCVD制备台阶折射率掺杂二氧化硅玻璃的净沉积效率

2014 IEEE 5th International Conference on Photonics (ICP) Pub Date : 2014-09-01 DOI:10.1109/ICP.2014.7002337

M. I. Zulkifli, N. Omar, M. S. Khairul Anuar, S. Hanif, S. Z. Muhd-Yasin, S. M. Aljamimi, Z. Yusoff, H. Abdul-Rashid

{"title":"MCVD制备台阶折射率掺杂二氧化硅玻璃的净沉积效率","authors":"M. I. Zulkifli, N. Omar, M. S. Khairul Anuar, S. Hanif, S. Z. Muhd-Yasin, S. M. Aljamimi, Z. Yusoff, H. Abdul-Rashid","doi":"10.1109/ICP.2014.7002337","DOIUrl":null,"url":null,"abstract":"The net deposition efficiency which describes the successful incorporation of germania in silica was studied by varying the GeCl4 flow rate while maintaining that of SiCl4 constant. Both theoretical and experimentally-derived net deposition efficiencies were determined. The radial and longitudinal homogeneities of the fabricated preform were also determined. EDX analysis was also carried out to confirm the germanium presence in the fabricated preform.","PeriodicalId":282572,"journal":{"name":"2014 IEEE 5th International Conference on Photonics (ICP)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Net deposition efficiency of step-index GeO2 doped silica glass fabricated by MCVD\",\"authors\":\"M. I. Zulkifli, N. Omar, M. S. Khairul Anuar, S. Hanif, S. Z. Muhd-Yasin, S. M. Aljamimi, Z. Yusoff, H. Abdul-Rashid\",\"doi\":\"10.1109/ICP.2014.7002337\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The net deposition efficiency which describes the successful incorporation of germania in silica was studied by varying the GeCl4 flow rate while maintaining that of SiCl4 constant. Both theoretical and experimentally-derived net deposition efficiencies were determined. The radial and longitudinal homogeneities of the fabricated preform were also determined. EDX analysis was also carried out to confirm the germanium presence in the fabricated preform.\",\"PeriodicalId\":282572,\"journal\":{\"name\":\"2014 IEEE 5th International Conference on Photonics (ICP)\",\"volume\":\"43 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 IEEE 5th International Conference on Photonics (ICP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICP.2014.7002337\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE 5th International Conference on Photonics (ICP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICP.2014.7002337","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

在保持SiCl4流量不变的情况下，通过改变GeCl4的流量，研究了锗在二氧化硅中成功掺入的净沉积效率。确定了理论和实验推导的净沉积效率。还测定了预制体的径向和纵向均匀性。EDX分析也证实了锗在预制体中的存在。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Net deposition efficiency of step-index GeO2 doped silica glass fabricated by MCVD

The net deposition efficiency which describes the successful incorporation of germania in silica was studied by varying the GeCl4 flow rate while maintaining that of SiCl4 constant. Both theoretical and experimentally-derived net deposition efficiencies were determined. The radial and longitudinal homogeneities of the fabricated preform were also determined. EDX analysis was also carried out to confirm the germanium presence in the fabricated preform.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2014 IEEE 5th International Conference on Photonics (ICP)

自引率

0.00%

发文量