7nm FinFet中的行为Shockley和Sakurai模型

M. Anees, K. Rahul, Sourabh Aditya Swarnkar, Santosh Yachareni
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引用次数: 3

摘要

随着我们向低节点移动,设备尺寸也在发生变化,变得越来越复杂。使用FinFet的高架通道,栅极电压从所有3个方向施加。栅极电场不再是单向的。这些增加了通过通道的电流行为的复杂性。传统的肖克利模型在饱和区依赖于过驱动电压的平方律将不再适用。为了克服模型的这一缺点,Sakurai- Newton b[1]引入了alpha幂模型。该方法准确地模拟了饱和区亚微米器件中晶体管的行为。根据该模型,器件在饱和区域不存在平方依赖。但是随着节点的缩小,功率将从2减少到1。当我们扩展节点时,电压没有明显的变化。随着速度饱和度的增加,alpha趋于1。为平面器件设计的模型与FinFet不同步。本文描述了7nm MOS在不同电压条件下的行为,并比较了finfet中肖克利平方定律模型和Sakurai-Newton α功率模型预测的电流行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Behaviour Shockley and Sakurai Models in 7nm FinFet
As we move towards lower nodes, device dimensions are changing and becoming more complex. With FinFet’s elevated channel, gate voltage is applied from all 3 directions. The gate electric field is no longer unidirectional. These add complexity in the behavior of current through the channel. Traditional Shockley model which had square law dependency on the over drive voltage in saturation region will no longer hold good. To overcome this shortcoming of the model alpha power model was introduced by Sakurai- Newton [1]. This accurately modeled the transistor behavior in submicron device in saturation region. According to this model the device will not have square dependency in saturation region. But will have power reduced from two to one as node shrinks. As we were scaling the nodes, there wasn’t any significant scaling in the voltage. As the velocity saturation becomes more dominant alpha reaches one. Models designed for the planar devices and are not in sync with the FinFet. Proposed paper describes the behavior of the MOS in 7nm across different voltage condition and comparison of the current behavior predicted from the Shockley’s square law model and Sakurai-Newton’s alpha power model in FinFets.
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