基于含氮化硼的梯度隙半导体氮化物的太赫兹范围转移电子器件的数值模拟

I. Storozhenko, A. N. Yaroshenko, Y. Arkusha
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引用次数: 0

摘要

本文给出了基于不同BN分布的InBN和GaBN梯度隙半导体化合物的n+-n-n+转移电子器件产生振荡的数值实验结果。我们得到了二极管在30 ~ 700 GHz宽频率范围内的输出特性。截止频率已估算。在最佳的氮化硼分布下,梯度隙半导体InBN和GaBN的效率超过GaN和InN二极管的两倍以上。级隙InBN和GaBN二极管的功耗比InN和GaN二极管的功耗低11÷19%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Numerical simulations of transferred-electron devices based on graded-gap semiconductor nitrides with boron nitride for terahertz range
The paper presents the results of numerical experiments on the oscillation generation using the n+-n-n+ transfer electron device based on InBN and GaBN graded-gap semiconductor compounds at different BN distribution. We had obtained the output characteristics of diodes in a wide range of frequencies from 30 to 700 GHz. Cutoff frequency has been estimated. At optimal BN distribution graded-gap semiconductor InBN and GaBN Gunn diodes for efficiency exceed GaN and InN diodes by more than two times. Power consumption of gradedgap InBN and GaBN diodes is 11÷19% less the power consumption of InN and GaN diodes.
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