在错取向GaN衬底上生长的InGaN MQWs的发光特性

C. Nenstiel, T. Switaisky, M. Alic, T. Suski, M. Albecht, Matthew R. Phillips, Axel Hoffmann
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引用次数: 0

摘要

基于InGaN的光电器件已经商业化,然而,铟含量限制在5%左右。随着铟浓度的增加,量子效率降低,这被认为是由于不均匀性的增加。在这项工作中,它表明了InGaN在错位GaN衬底上的生长迫使这些铟在纳米尺度上波动。温度相关的发光测量提供了能带结构均匀性的信息。能量选择激发证实了定位中心的存在,并指出了它们的能量深度。时间分辨测量定义了局域激子的寿命,它提供了有关辐射和非辐射过程以及局域中心之间隧穿机制的信息。采用阴极发光(CL)和微光发光(μPL)分别测量了铟在nm和µm尺度上的波动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Luminescence of InGaN MQWs grown on misorientated GaN substrates
Optoelectronic devices based on InGaN have already been commercialised, however, the Indium content is limited to around 5%. With higher Indium concentration the quantum efficiency decreases, which is thought to be due to increasing inhomogeneity. In this work it is shown that the growth of InGaN on misorientated GaN substrates forces these Indium fluctuations on a nanometre scale. Temperature dependent luminescence measurements provide information about the homogeneity of the band structure. Energy selective excitation confirms the existence of localisation centres and indicates their energetic depth. Time-resolved measurements define the lifetime of localized excitons, which provides information about radiative and nonradiative processes as well as tunnelling mechanisms between the localization centres. Indium fluctuations at the nm and µm scale are measured using cathodoluminescence (CL) and Micro Photoluminescence (μPL) respectively.
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