一个5nm 5.7GHz@1.0V和1.3GHz@0.5V 4kb基于标准单元的双端口寄存器文件,具有16T位单元,没有半选择问题

H. Fujiwara, Y. Nien, Chih-Yu Lin, H. Pan, H. Hsu, Shin-Rung Wu, Yao-Yi Liu, Yen-Huei Chen, H. Liao, Jonathan Chang
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引用次数: 2

摘要

晶体管的持续缩放增加了Vt的随机变化,这限制了最小工作电压$(V_{\ mathm {MIN}})$。此外,SRAM位单元、外围电路和标准逻辑之间的鳍形差异,由于鳍到鳍边界的空白空间和所需的假体,会降低区域效率[1]。使用经典SRAM设计的小容量存储器最容易受到这个问题的影响。在本文中,我们将提出一个5nm基于数字的SRAM宏,其16T单元支持位写掩码操作。我们采用标准单元规则进行SRAM布局设计。16T单元的面积比代工的6T SRAM单元大;然而,小容量SRAM的总宏面积较小,因为宏中没有空白空间,并且由于其简单的外围电路。此外,所提出的SRAM可以直接与标准单元区域相邻。由于基于数字位单元设计的优势,所提出的SRAM可以支持超宽范围电压工作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 5nm 5.7GHz@1.0V and 1.3GHz@0.5V 4kb Standard-Cell- Based Two-Port Register File with a 16T Bitcell with No Half-Selection Issue
Continued scaling of the transistor increases random Vt variation, which limits the minimum operating voltage $(V_{\mathrm{MIN}})$. Furthermore, fin formation differences between the SRAM bitcells, the peripheral circuits and the standard logic degrade area efficiency due to the empty spaces at fin-to-fin boundary and the required dummy [1]. Memories with small capacities that use the classical SRAM design suffer from this issue the most. In this paper, we will propose a 5nm digital-based SRAM macro with a 16T cell supporting a bit-write-mask operation. We adopted the standard cell rules for the proposed SRAM layout design. The area of the 16T cell is larger than the foundry’s 6T SRAM cell; however, the total macro area of a small capacity SRAM is smaller since there is no empty space in the macro and due to its simple peripheral circuit. In addition, the proposed SRAM can be directly abutted with the standard cell region. The proposed SRAM can support ultra-wide range voltage operation due to the advantages of a digital-based bitcell design.
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