H. Fujiwara, Y. Nien, Chih-Yu Lin, H. Pan, H. Hsu, Shin-Rung Wu, Yao-Yi Liu, Yen-Huei Chen, H. Liao, Jonathan Chang
{"title":"一个5nm 5.7GHz@1.0V和1.3GHz@0.5V 4kb基于标准单元的双端口寄存器文件,具有16T位单元,没有半选择问题","authors":"H. Fujiwara, Y. Nien, Chih-Yu Lin, H. Pan, H. Hsu, Shin-Rung Wu, Yao-Yi Liu, Yen-Huei Chen, H. Liao, Jonathan Chang","doi":"10.1109/ISSCC42613.2021.9366000","DOIUrl":null,"url":null,"abstract":"Continued scaling of the transistor increases random Vt variation, which limits the minimum operating voltage $(V_{\\mathrm{MIN}})$. Furthermore, fin formation differences between the SRAM bitcells, the peripheral circuits and the standard logic degrade area efficiency due to the empty spaces at fin-to-fin boundary and the required dummy [1]. Memories with small capacities that use the classical SRAM design suffer from this issue the most. In this paper, we will propose a 5nm digital-based SRAM macro with a 16T cell supporting a bit-write-mask operation. We adopted the standard cell rules for the proposed SRAM layout design. The area of the 16T cell is larger than the foundry’s 6T SRAM cell; however, the total macro area of a small capacity SRAM is smaller since there is no empty space in the macro and due to its simple peripheral circuit. In addition, the proposed SRAM can be directly abutted with the standard cell region. The proposed SRAM can support ultra-wide range voltage operation due to the advantages of a digital-based bitcell design.","PeriodicalId":371093,"journal":{"name":"2021 IEEE International Solid- State Circuits Conference (ISSCC)","volume":"03 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-02-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A 5nm 5.7GHz@1.0V and 1.3GHz@0.5V 4kb Standard-Cell- Based Two-Port Register File with a 16T Bitcell with No Half-Selection Issue\",\"authors\":\"H. Fujiwara, Y. Nien, Chih-Yu Lin, H. Pan, H. Hsu, Shin-Rung Wu, Yao-Yi Liu, Yen-Huei Chen, H. Liao, Jonathan Chang\",\"doi\":\"10.1109/ISSCC42613.2021.9366000\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Continued scaling of the transistor increases random Vt variation, which limits the minimum operating voltage $(V_{\\\\mathrm{MIN}})$. Furthermore, fin formation differences between the SRAM bitcells, the peripheral circuits and the standard logic degrade area efficiency due to the empty spaces at fin-to-fin boundary and the required dummy [1]. Memories with small capacities that use the classical SRAM design suffer from this issue the most. In this paper, we will propose a 5nm digital-based SRAM macro with a 16T cell supporting a bit-write-mask operation. We adopted the standard cell rules for the proposed SRAM layout design. The area of the 16T cell is larger than the foundry’s 6T SRAM cell; however, the total macro area of a small capacity SRAM is smaller since there is no empty space in the macro and due to its simple peripheral circuit. In addition, the proposed SRAM can be directly abutted with the standard cell region. The proposed SRAM can support ultra-wide range voltage operation due to the advantages of a digital-based bitcell design.\",\"PeriodicalId\":371093,\"journal\":{\"name\":\"2021 IEEE International Solid- State Circuits Conference (ISSCC)\",\"volume\":\"03 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-02-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 IEEE International Solid- State Circuits Conference (ISSCC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC42613.2021.9366000\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE International Solid- State Circuits Conference (ISSCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC42613.2021.9366000","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 5nm 5.7GHz@1.0V and 1.3GHz@0.5V 4kb Standard-Cell- Based Two-Port Register File with a 16T Bitcell with No Half-Selection Issue
Continued scaling of the transistor increases random Vt variation, which limits the minimum operating voltage $(V_{\mathrm{MIN}})$. Furthermore, fin formation differences between the SRAM bitcells, the peripheral circuits and the standard logic degrade area efficiency due to the empty spaces at fin-to-fin boundary and the required dummy [1]. Memories with small capacities that use the classical SRAM design suffer from this issue the most. In this paper, we will propose a 5nm digital-based SRAM macro with a 16T cell supporting a bit-write-mask operation. We adopted the standard cell rules for the proposed SRAM layout design. The area of the 16T cell is larger than the foundry’s 6T SRAM cell; however, the total macro area of a small capacity SRAM is smaller since there is no empty space in the macro and due to its simple peripheral circuit. In addition, the proposed SRAM can be directly abutted with the standard cell region. The proposed SRAM can support ultra-wide range voltage operation due to the advantages of a digital-based bitcell design.