高强度紫外辐射下Mo-Si多层反射涂层的畸变与损伤研究

Soft-X-Ray Projection Lithography Pub Date : 1900-01-01 DOI:10.1364/sxray.1992.tub7

H. Bender, W. Silfvast, K. Beck

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引用次数: 0

摘要

本文报道了利用XeCl准分子激光308 nm脉冲辐射模拟软x射线辐照，研究了Mo-Si多层软x射线反射涂层的光学畸变和损伤阈值。初步实验结果显示，变形和损伤阈值分别为260 mJ/cm2和500 mJ/cm2。

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Investigation of Distortion and Damage of Mo-Si Multilayer Reflective Coatings with High Intensity UV Radiation

We report on studies of optical distortion and damage thresholds of Mo-Si multilayer soft x-ray reflective coatings using 308 nm pulsed radiation from a XeCl excimer laser to simulate soft x-ray irradiation. Preliminary experimental results yielded values of 260 mJ/cm2 and 500 mJ/cm2 for distortion and damage thresholds.

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Soft-X-Ray Projection Lithography

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